Computational manufacturing of optical interference coatings: method, simulation results, and comparison with experiment

摘要

Virtual deposition runs have been performed to estimate the production yield of selected oxide optical interference coatings when plasma ion-assisted deposition with an advanced plasma source is applied. Thereby, deposition of each layer can be terminated either by broadband optical monitoring or quartz crystal monitoring. Numerous deposition runs of single-layer coatings have been performed to investigate the reproducibility of coating properties and to quantify deposition errors for the simulation. Variations of the following parameters are considered in the simulation: refractive index, extinction coefficient, and film thickness. The refractive index and the extinction coefficient are simulated in terms of the oscillator model. The parameters are varied using an apodized normal distribution with known mean value and standard deviation. Simulation of variations in the film thickness is performed specific to the selected monitoring strategy. Several deposition runs of the selected oxide interference coatings have been performed to verify the simulation results by experimental data.