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首页> 外文期刊>Applied optics >Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface
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Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface

机译:两球波紫外线干涉仪,用于在曲面上制作抗反射亚波长周期性图案

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摘要

An ultraviolet two-spherical-wave interferometer was developed in order to make a subwavelength structured surface on a curved surface. The change in fringe period on the curved surface was significantly suppressed compared with the two-plane-wave interferometer. The optical setup method for suppressing the change in fringe period is described. The effect of the two-spherical-wave interferometer was investigated by numerical simulations. In an experimental demonstration for a concave spherical surface with 11.1 mm radius of curvature and 10 mm diameter, the change in period of the photoresist pattern was reduced to 12 nm for the target period of 250 nm.
机译:为了在弯曲表面上形成亚波长结构表面,开发了紫外双球面波干涉仪。与两平面波干涉仪相比,曲面上的条纹周期的变化得到了显着抑制。说明用于抑制条纹周期的变化的光学设置方法。通过数值模拟研究了双球面波干涉仪的影响。在具有11.1mm曲率半径和10mm直径的凹球形表面的实验演示中,对于250nm的目标周期,光致抗蚀剂图案的周期变化减小到12nm。

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