Determining thickness of films on a curved substrate by use of ellipsometric measurements

摘要

A three-intensity measurement technique has been employed in polarizer-sample-analyzer imaging ellipsometry to measure the two-dimensional ellipsometric parameters of a coated cylindrical lens. Since azimuth deviation a of a polarizer can also be measured with this three-intensity measurement technique, we tilted a well-calibrated thin-film wafer to identify the orientation of the measured a with respect to the incident plane. Using the analytic property of this measurement technique, we can correct the deviation and determine the thickness profile of the thin film coated on a cylindrical lens.