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Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica

机译:折射率对折射率的温度依赖性的干涉测量:应用于熔融石英

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摘要

The light reflected by an uncoated Fabry-Perot etalon presents dark rings which give a very sensitive measurement of the variations of the return optical path in the etalon. By measuring the diameters of these rings as a function of the etalon temperature T, we get a sensitive measurement of the derivative dn/dT of the index of refraction n. We have made this experiment with a fused silica etalon and we have achieved a 2percent relative uncertainty on dn/dT, comparable to the uncertainty of the best experiments.
机译:未镀膜的Fabry-Perot校准器反射的光呈现出暗环,可对校准器中返回光路的变化进行非常灵敏的测量。通过测量这些环的直径作为标准具温度T的函数,我们可以灵敏地测量折射率n的导数dn / dT。我们已经使用熔融的硅标准具进行了该实验,并且在dn / dT上实现了2%的相对不确定度,与最佳实验的不确定度相当。

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