Masking mechanisms applied to thin-film coatings for the manufacturing of linear variable filters for two-dimensional array detectors

摘要

We propose a method for manufacturing linear variable interference filters for two-dimensional (2D) array detectors, based on the use of correcting masks combining both rotation and translation movements of the masks and substrates. The major advantage of this method is its capability to produce several identical filters in a single run. 20 mm X 20 mm samples were manufactured with a wavelength ratio almost equal to 2 along the thickness gradient direction. In agreement with calculations, the measured uniformity perpendicular to the gradient is about 99.8percent along 20 mm.