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首页> 外文期刊>Applied optics >Optical and electrical properties between 0.4 and 12 (mu)m for Sn-doped In_(2)O_(3) films by pulsed laser deposition and cathode sputtering
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Optical and electrical properties between 0.4 and 12 (mu)m for Sn-doped In_(2)O_(3) films by pulsed laser deposition and cathode sputtering

机译:通过脉冲激光沉积和阴极溅射对掺Sn的In_(2)O_(3)薄膜的光学和电学性质介于0.4和12μm之间

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Optical properties of Sn-doped In_(2)O_(3) (ITO) have been studied in the optical range of 0.4-12 (mu)m. Adeposition has been made on BK7 glass, magnesium fluoride, sapphire, and zinc sulfide substrates. The layers have been characterized by their optical properties, DC electrical sheet resistivity, and Hall mobility. Sheet resistivity lies in the range of 6.8-318 OMEGA/sq for thicknesses between 16 and 280 nm. The best carrier mobility is obtained on BK7 and sapphire substrates, up to approx50 cm~(2)/V s. The material shows good infrared transparency in the 3-5 (mu)m range on magnesium fluoride and 0.4-4 (mu)m on sapphire, and it is usable for practical applications up to 12 (mu)m on zinc sulfide. Simulations have been carried out for optical indices and spectra calculations. The Drude model has been used to exploit the results in either direction: from electrical measured data to the simulation of optical spectra and indices, and from measured optical spectra to simulated optical indices and electrical parameters (mobility, carrier density). Hall mobility is considered a worthy and convenient material quality criteria for materials aimed at optics.
机译:已经在0.4-12μm的光学范围内研究了掺Sn的In_(2)O_(3)(ITO)的光学性质。已经在BK7玻璃,氟化镁,蓝宝石和硫化锌基板上进行了沉积。这些层的特征在于它们的光学特性,直流电薄层电阻率和霍尔迁移率。对于16至280nm之间的厚度,薄层电阻率在6.8-318Ω/ sq的范围内。在BK7和蓝宝石衬底上获得最佳载流子迁移率,最高约50 cm〜(2)/ V s。该材料在氟化镁上3-5微米范围内,在蓝宝石上0.4-4微米范围内显示出良好的红外透明性,并且可用于实际应用中硫化锌上高达12微米的红外透明度。已经进行了光学指数和光谱计算的模拟。 Drude模型已用于从两个方向利用结果:从电测量数据到光谱和指数的模拟,从测量光谱到模拟光指数和电参数(迁移率,载流子密度)。霍尔移动性被认为是针对光学材料的有价值且方便的材料质量标准。

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