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The Nature of Photocatalytic 'Water Splitting' on Silicon Nanowires

机译:硅纳米线上光催化“水分解”的性质

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摘要

Silicon should be an ideal semiconductor material if it can be proven usable for photocatalytic water splitting, given its high natural abundance. Thus it is imperative to explore the possibility of water splitting by running photocatalysis on a silicon surface and to decode the mechanism behind it. It is reported that hydrogen gas can indeed be produced from Si nanowires when illuminated in water, but the reactions are not a real water-splitting process. Instead, the production of hydrogen gas on the Si nanowires occurs through the cleavage of SiH bonds and the formation of SiOH bonds, resulting in the low probability of generating oxygen. On the other hand, these two types of surface dangling bonds both extract photoexcited electrons, whose competition greatly impacts on carrier lifetime and reaction efficiency. Thus surface chemistry holds the key to achieving high efficiency in such a photocatalytic system.
机译:如果硅由于其天然丰度高而被证明可用于光催化水分解,那么它应该是一种理想的半导体材料。因此,必须探索在硅表面上进行光催化分解水的可能性,并对其背后的机理进行解码。据报道,当在水中照射时,确实可以从Si纳米线产生氢气,但是反应不是真正的水分解过程。取而代之的是,Si纳米线上的氢气产生是通过SiH键的断裂和SiOH键的形成而发生的,从而导致产生氧气的可能性较低。另一方面,这两种类型的表面悬空键都提取出光激发电子,它们的竞争极大地影响了载流子寿命和反应效率。因此,表面化学是在这种光催化系统中实现高效率的关键。

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