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Copper as a Robust and Transparent Electrocatalyst for Water Oxidation

机译:铜是用于水氧化的稳健而透明的电催化剂

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摘要

Copper metal is in theory a viable oxidative electrocatalyst based on surface oxidation to Cu-III and/or Cu-IV, but its use in water oxidation has been impeded by anodic corrosion. The in situ formation of an efficient interfacial oxygen-evolving Cu catalyst from Cu-II in concentrated carbonate solutions is presented. The catalyst necessitates use of dissolved Cu-II and accesses the higher oxidation states prior to decompostion to form an active surface film, which is limited by solution conditions. This observation and restriction led to the exploration of ways to use surface-protected Cu metal as a robust electrocatalyst for water oxidation. Formation of a compact film of CuO on Cu surface prevents anodic corrosion and results in sustained catalytic water oxidation. The Cu/CuO surface stabilization was also applied to Cu nanowire films, which are transparent and flexible electrocatalysts for water oxidation and are an attractive alternative to ITO-supported catalysts for photoelectrochemical applications.
机译:从理论上讲,铜金属是一种可行的氧化性电催化剂,其基于表面氧化成Cu-III和/或Cu-IV,但是由于阳极腐蚀,其在水氧化中的应用受到了阻碍。提出了在浓碳酸盐溶液中由Cu-II原位形成高效的界面析氧Cu催化剂。催化剂必须使用溶解的Cu-II,并在分解前形成较高的氧化态以形成活性表面膜,该表面膜受溶液条件的限制。这种观察和限制导致人们探索了使用表面保护的铜金属作为水氧化的可靠电催化剂的方法。在铜表面上形成致密的CuO膜可防止阳极腐蚀并导致持续的催化水氧化。 Cu / CuO表面稳定剂也应用于铜纳米线薄膜,该薄膜是用于水氧化的透明和柔性电催化剂,是用于光电化学应用的ITO负载型催化剂的有吸引力的替代品。

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