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首页> 外文期刊>Angewandte Chemie >An Yttrium Hydride-Silane Complex as a Structural Model for a σ-Bond Metathesis Transition State
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An Yttrium Hydride-Silane Complex as a Structural Model for a σ-Bond Metathesis Transition State

机译:氢化钇-硅烷复合物作为σ键易位过渡态的结构模型

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摘要

The transition-metal-promoted Si—H bond cleavage is a pivotal step in several important catalytic processes, such as hydrosilylation, hydrosilane dehydropolymerization, and dehydrogenative silylation. There are two different mechanisms for the metal-mediated Si—H bond cleavage: a) oxidative addition of Si—H bond toward a low-valent electron-rich metal, in which a σ-complex is believed to be the key intermediate; and b) σ-bond metathesis of Si—H and M—E bonds (E = C, N, H, etc.) via a four-center transition state (Scheme 1). As evidence for the oxidative addition mech- anism, σ-silane transition-metal complexes have been well documented. For d~0-transition-metal complexes, the oxidative addition is impossible, and the Si—H bond cleavage proceeds through the a-bond metathesis mechanism. However, to the best of our knowledge, there has been no report of such a d~0-transition-metal complex, which can be considered as a model for the σ-bond metathesis transition state. On the other hand, β-agostic interactions between metal ions and Si— H bonds are commonly observed in the coordinative unsaturated d~0-transition-metal complexes.
机译:过渡金属促进的Si-H键断裂是几个重要催化过程中的关键步骤,例如氢化硅烷化,氢化硅烷脱氢聚合和脱氢甲硅烷基化。金属介导的Si-H键断裂有两种不同的机理:a)Si-H键向低价电子富集金属的氧化加成,其中σ-络合物被认为是关键的中间体; b)通过一个四中心过渡态(方案1),Si-H和M-E键(E = C,N,H等)的σ键易位。作为氧化加成机理的证据,σ-硅烷过渡金属配合物已得到充分证明。对于d〜0过渡金属络合物,不可能进行氧化加成,Si-H键的断裂通过a键复分解机制进行。然而,据我们所知,还没有关于这种d〜0过渡金属络合物的报道,可以将其视为σ键易位过渡态的模型。另一方面,通常在配位不饱和d〜0-过渡金属络合物中观察到金属离子与Si-H键之间的β-声波相互作用。

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