Frustrated Phases of Block Copolymers in Nanoparticles

摘要

Microphase separation structures of block copolymers have attracted much interest as novel building blocks for the creation of nanometer-scale structures. In block copolymer films, various kinds of microphase separation structures (e.g., cylindrical, lamellar, bicontinuous, and others), which are dependent on the segment ratio and molecular weight of the block copolymer, have been reported. Microphase separation structures have been applied to etching masks for lithography, the formation of metal arrays, photonic crystals, and laser devices, because block copolymers form highly ordered nanoscale structures through simple preparation processes, such as spin coating.