...
首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Field emission characteristics of single crystal LaB6 field emitters fabricated by electrochemical etching method
【24h】

Field emission characteristics of single crystal LaB6 field emitters fabricated by electrochemical etching method

机译:电化学刻蚀法制备的单晶LaB6场致发射体的场发射特性

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Single crystal lanthanum hexaboride (LaB6) field emission arrays with uniform tip structures have been achieved using the electrochemical etching method and the field emission characteristics are evaluated. A direct current voltage source is introduced in the etching process and phosphoric acid is used as the electrolyte solution. The SEM observation of the emitters reflects the feasibility of the electrochemical etching method for the fabrication of single crystal LaB6 FEA. The turn- on field of LaB6 FEA is low at 3.2V mu m(-1) and the emission current exhibits high stability during the 20- minute operation. Furthermore, even at low vacuum (> 1.5 x 10(-5) Torr) it still exhibits good emission properties and a strong ability to withstand the ion bombardment, which is useful for low operation vacuum microelectronic devices.
机译:使用电化学刻蚀方法已经获得了具有均匀尖端结构的单晶六硼化镧(LaB6)场致发射阵列,并评估了场致发射特性。在蚀刻过程中引入直流电压源,并使用磷酸作为电解液。发射极的SEM观察反映出电化学蚀刻方法可用于制造单晶LaB6 FEA。 LaB6 FEA的导通电场很低,为3.2Vμm(-1),并且在20分钟的操作过程中,发射电流具有很高的稳定性。此外,即使在低真空(> 1.5 x 10(-5)Torr)下,它仍然显示出良好的发射特性和强大的抵抗离子轰击的能力,这对于低操作真空微电子器件很有用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号