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首页> 外文期刊>Journal of Low Power Electronics >Analytical Model for Key Electrical Parameter of Superjunction VDMOS
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Analytical Model for Key Electrical Parameter of Superjunction VDMOS

机译:超结VDMOS关键电气参数的解析模型

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摘要

Breakdown voltage (V_B) and on-resistance (R_(ON)) are the key electricity parameters of Vertical Double-diffused Metal Oxide Semiconductor Field-effect Transistor (VDMOS). Compared with conventional VDMOS, the on-resistance of Superjunction (SJ) VDMOS can be reduced by one-fifth under the same breakdown voltage. In this paper, the potential equation of SJ-VDMOS is obtained based on device physics theory firstly. Then, we establish the analytical model of SJ-VDMOS for the relations between the key electrical parameter (breakdown voltage and on-resistance) and geometry accompanied by materials physics parameter. The results show that: (1) The breakdown voltage first increases then decreases with the increasing doping content of SJ-VDMOS; (2) The breakdown voltage increases with the increasing P depth of SJ-VDMOS at low doping content. However, it first increases then decreases with the increasing P depth of SJ-VDMOS at high doping content; (3) The breakdown voltage increases with the decreasing P lateral scale of SJ-VDMOS; (4) Due to the contradiction between breakdown voltage and on-resistance, there are the relations between the on-resistance and geometry and materials physics parameter. Our optimized results will provide important theoretical references to design and produce SJ-VDMOS.
机译:击穿电压(V_B)和导通电阻(R_(ON))是垂直双扩散金属氧化物半导体场效应晶体管(VDMOS)的关键电参数。与传统的VDMOS相比,在相同的击穿电压下,超结(SJ)VDMOS的导通电阻可以减小五分之一。本文首先基于器件物理理论推导了SJ-VDMOS的电势方程。然后,针对关键电参数(击穿电压和导通电阻)与几何形状以及材料物理参数之间的关系,建立了SJ-VDMOS的解析模型。结果表明:(1)随着SJ-VDMOS掺杂量的增加,击穿电压先升高后降低。 (2)在低掺杂含量下,击穿电压随着SJ-VDMOS的P深度的增加而增加。但是,在高掺杂含量下,随着SJ-VDMOS的P深度增加,它会先增加然后减少。 (3)击穿电压随着SJ-VDMOS的P横向尺寸的减小而增加; (4)由于击穿电压与导通电阻之间的矛盾,导通电阻与几何形状和材料物理参数之间存在关系。我们的优化结果将为设计和生产SJ-VDMOS提供重要的理论参考。

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