Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy

摘要

Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments(three in Argon,three in Argon and Hydrogen,and three in ultra-high vacuum),and also a film was held at 70 °C while being exposed to a vapor from hydrazine monohydrate.The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions.X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films;heating in ultra-high vacuum was particularly effective.The overtone region of the Raman spectrum was used,for the first time,to provide a"fingerprint"of changing oxygen content.