An integrated technology CAD system for process and device designers

摘要

A workstation-based integrated system with a highly interactive X/Motif user interface is discussed. At present, TSUPREM3, TSUPREM4 and TPISCES have been integrated into this system. The components of the integrated TCAD system include a generic process recipe editor, a mask editor, a 2-D wafer structure builder (using 1-D/2-D process simulation profiles), a mesh generator for 2-D device simulation, a device simulation recipe editor, and graphical postprocessors for both process and device analysis. The user of this system inputs the specification of a process recipe and the layout of the device structure to be fabricated. The system then runs process and device simulation using incremental and shared simulation strategies to generate wafer structure and electrical device characteristics. An interactive user interface guides the user through the process and device simulation flow. thereby aiding what-if analysis of process and device tradeoffs.