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首页> 外文期刊>IEEE Journal of Solid-State Circuits >Ultrahigh efficiency obtained with GaAs-on-insulator MESFETtechnology
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Ultrahigh efficiency obtained with GaAs-on-insulator MESFETtechnology

机译:绝缘体上GaAs MESFET技术获得的超高效率

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摘要

Significant results of measurement and calculation of power-addednefficiency (PAE) and drain efficiency are presented for MESFET's thatnuse GaAs-on-insulator. Ultrahigh PAE of 89% was obtained at 8 GHz with angain of 9.6 dB using a 3-V supply. When the voltage was increased to 4nV, the peak PAE was 93% at 210 mW/mm with 9.2-dB gain. The idealncurrent-voltage characteristics with practically zero leakage currentnand large transconductance near pinchoff yielded PAE values approachingnthe theoretical limits of overdriven operation. The application ofnconventional assumptions concerning drain efficiency is discussednrelative to devices that approach these theoretical limits. Alsondiscussed are the pitfalls of various figures of merit of efficiencynwhen applied to these devices. Hence, there are two types of technicalnbarriers associated with very-high-efficiency devices: the physicalnrealization and their characterization
机译:对于使用绝缘体上的砷化镓的MESFET,提出了测量和计算功率附加效率(PAE)和漏极效率的重要结果。使用3V电源在8 GHz时获得了89%的超高PAE,增益为9.6 dB。当电压增加到4nV时,峰值PAE在210 mW / mm时为93%,增益为9.2dB。理想的n电流-电压特性(几乎为零泄漏电流n以及在pinchoff附近具有较大的跨导)产生的PAE值接近过驱动操作的理论极限。涉及接近这些理论极限的器件讨论了关于排水效率的常规假设的应用。当应用于这些设备时,还讨论了各种效率指标的陷阱。因此,与非常高效的设备相关的技术障碍有两种:物理实现及其表征

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