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Influence of dysprosium doping on the electrical and optical properties of CdO thin films

机译:掺杂对CdO薄膜电学和光学性能的影响

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摘要

Lightly Dy-doped CdO thin films (molar 0.5%, 1%, 2%, and 2.5%) have been prepared by a vacuum evaporation method on glass and Si wafer substrates. The prepared films were characterised by X-ray fluorescence, X-ray diffraction, UV-vis-NIR absorption spectros-copy, and dc-electrical measurements. Experimental data indicate that Dy~(3+) doping slightly stretchy-stresses the CdO crystalline structure and changes the optical and electrical properties. The bandgap of CdO was suddenly narrowed by about 20% due to a little doping with Dy~(3+) ions. Then, as the Dy doping level was increased, the energygap was also increased. This variation was explained by the effect of Burstein-Moss energy shift (or bandgap widening effect) together with a bandgap shrinkage effect. The electrical behaviour of the samples shows that they are degenerate semiconductors. However, the 2% Dy-doped CdO sample shows an increase in its mobility by about 3.5 times, conductivity by 35 times, and carrier concentration by 10 times relative to undoped CdO film. From transparent conducting oxide point of view, Dy is sufficiently effective for CdO doping.
机译:已经通过真空蒸发法在玻璃和硅晶片基板上制备了轻度Dy掺杂的CdO薄膜(摩尔浓度为0.5%,1%,2%和2.5%)。通过X射线荧光,X射线衍射,UV-vis-NIR吸收光谱和DC-电学测量来表征所制备的膜。实验数据表明,Dy〜(3+)掺杂对CdO晶体结构产生了轻微的拉伸应力,并改变了其光学和电学性质。由于对Dy〜(3+)离子的少量掺杂,CdO的带隙突然缩小了约20%。然后,随着Dy掺杂水平的增加,能隙也增加。这种变化是由Burstein-Moss能量偏移(或带隙加宽效应)和带隙收缩效应共同作用所解释的。样品的电性能表明它们是简并的半导体。但是,相对于未掺杂的CdO膜,掺有2%Dy的CdO样品的迁移率提高了约3.5倍,电导率提高了35倍,载流子浓度提高了10倍。从透明导电氧化物的观点来看,Dy对于CdO掺杂足够有效。

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