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Piezoelectric properties of zinc oxide films on glass substratesdeposited by RF-magnetron-mode electron cyclotron resonance sputteringsystem

机译:射频磁控模式电子回旋共振溅射系统沉积玻璃基板上氧化锌膜的压电特性

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There are various types of electron cyclotron resonance (ECR)nsputtering systems, DC-mode, RF-mode, etc. We reported that zinc oxiden(ZnO) films on glass substrates deposited by DC-mode ECR and RF-mode ECRnsputtering systems had shown excellent piezoelectric properties andnc-axis orientations. The RF-mode ECR sputtering system was capable ofndepositing ZnO films on glass substrates without evidence of column andnfiber grains in cross section and driving a 1.1 GHz fundamental Rayleighnsurface acoustic wave (SAW). In this paper, the properties of ZnO filmndeposited by an RF-magnetron-mode ECR sputtering system, which has addednmagnets to the outside of a cylindrical zinc metal (Zn) target of thenRF-mode ECR sputtering system, are investigated. It is confirmed thatnthe SAW filters using ZnO films on an interdigital transducern(IDT)/glass substrate deposited by the RF-magnetron-mode ECR sputteringnexhibit almost the same effective electromechanical coupling factorsn(keff) as the theoretical keff values calculated by finite elementnmethod (FEM) using the constants of ZnO single crystal (measured keffnvalues are 97% of the theoretical values) and 0.6~3.7 dB lower insertionnloss in comparison with the films deposited by the DC-mode ECR and thenRF-mode ECR sputtering system
机译:有各种类型的电子回旋共振(ECR)n溅射系统,DC模式,RF模式等。我们报道了通过DC模式ECR和RF模式ECRn溅射系统在玻璃基板上沉积的氧化锌(ZnO)膜已显示出优良的压电性能和nc轴取向。射频模式ECR溅射系统能够在玻璃基板上沉积ZnO薄膜,而没有横截面出现柱状和纤维状颗粒的迹象,并能够驱动1.1 GHz基本瑞利表面声波(SAW)。本文研究了射频磁控模式ECR溅射系统沉积的ZnO的性能,该方法在射频模式ECR溅射系统的圆柱形锌金属(Zn)靶材外部增加了磁体。可以肯定的是,在射频磁控模式ECR溅射沉积的叉指式换能器(IDT)/玻璃基板上使用ZnO膜的SAW滤波器,其有效机电耦合因子n(keff)几乎与有限元方法(FEM)计算出的理论keff值相同。 )使用ZnO单晶的常数(测得的keffn值为理论值的97%),与直流模式ECR和射频模式ECR溅射系统沉积的薄膜相比,插入损耗低0.6〜3.7 dB

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