...
首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Characterization of dielectric and electro-optic properties of PLZT 9/65/35 films on sapphire for electro-optic applications
【24h】

Characterization of dielectric and electro-optic properties of PLZT 9/65/35 films on sapphire for electro-optic applications

机译:用于电光应用的蓝宝石上PLZT 9/65/35膜的介电和电光特性的表征

获取原文
获取原文并翻译 | 示例
           

摘要

Lead lanthanum zirconate titanate (PLZT) thin films were deposited on r-plane sapphire at low temperatures by RF triode magnetron sputtering using lead compensated hot-pressed targets. To obtain fully perovskite phase in the films, two types of post-deposition processing were investigated: rapid thermal annealing (RTA) and furnace annealing (FA). Dielectric and electro-optic properties of PLZT films were found to be strongly dependent on annealing conditions. The peak dielectric constant of the films were 1200 and 2800 with Curie temperatures of 110/spl deg/C and 190/spl deg/C after RTA and FA processing, respectively. The dielectric losses in the films were fairly low; tan deltas were less than 0.02 after RTA and less than 0.04 after FA processing. The films showed good optical transmission characteristics after annealing and an anomalously large effective quadratic electro-optic effect was observed in one furnace annealed film.
机译:钛酸锆钛酸铅(PLZT)薄膜在低温下通过RF三极管磁控溅射法使用铅补偿的热压靶在r面蓝宝石上沉积。为了在膜中获得完全钙钛矿相,研究了两种类型的沉积后处理:快速热退火(RTA)和熔炉退火(FA)。发现PLZT膜的介电和电光特性强烈取决于退火条件。经过RTA和FA处理后,居里温度分别为110 / spl deg / C和190 / spl deg / C时,薄膜的峰值介电常数为1200和2800。薄膜中的介电损耗相当低。 RTA处理后的tanδ小于0.02,FA处理后的tanδ小于0.04。该膜在退火后显示出良好的光学透射特性,并且在一个炉退火的膜中观察到异常大的有效二次电光效应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号