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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Characterization of dielectric and electro-optic properties of PLZT9/65/35 films on sapphire for electro-optic applications
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Characterization of dielectric and electro-optic properties of PLZT9/65/35 films on sapphire for electro-optic applications

机译:用于电光应用的蓝宝石上PLZT9 / 65/35薄膜的介电和电光特性的表征

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Lead lanthanum zirconate titanate (PLZT) thin films were depositednon r-plane sapphire at low temperatures by RF triode magnetronnsputtering using lead compensated hot-pressed targets. To obtain fullynperovskite phase in the films, two types of post-deposition processingnwere investigated: rapid thermal annealing (RTA) and furnace annealingn(FA). Dielectric and electro-optic properties of PLZT films were foundnto be strongly dependent on annealing conditions. The peak dielectricnconstant of the films were 1200 and 2800 with Curie temperatures ofn110°C and 190°C after RTA and FA processing, respectively. Thendielectric losses in the films were fairly low; tan deltas were lessnthan 0.02 after RTA and less than 0.04 after FA processing. The filmsnshowed good optical transmission characteristics after annealing and annanomalously large effective quadratic electro-optic effect was observednin one furnace annealed film
机译:钛酸镧锆钛酸铅(PLZT)薄膜是在低温下通过射频三极管磁控溅射法使用铅补偿的热压靶在r面蓝宝石上沉积的。为了在薄膜中获得完全钙钛矿相,研究了两种类型的沉积后处理:快速热退火(RTA)和炉内退火(FA)。发现PLZT膜的介电和电光性质强烈依赖于退火条件。经过RTA和FA处理后,薄膜的峰值介电常数分别为1200和2800,居里温度分别为110℃和190℃。薄膜中的介电损耗相当低。 RTA处理后的tanδ小于0.02,FA处理后的tanδ小于0.04。退火后该膜表现出良好的光透射特性,在一炉退火后的膜上观察到较大的有效二次电光效应。

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