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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >New seed geometry for growth of low dislocation synthetic quartz
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New seed geometry for growth of low dislocation synthetic quartz

机译:用于低位错合成石英生长的新型晶种

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摘要

A method to grow low dislocation density synthetic quartz by usingna special cutting seed geometry is reported. With this method, anrelatively high dislocation density seed material is allowable. For suchna purpose, a seed of new geometry was prepared and grown in a standardnhydrothermal growth condition, long in Y-direction with multiplenV-shaped notches made on Z-face. The characterization study wasnconducted by X-ray topography. The results showed new growth regions,nequal to the numbers of V-shaped notches made in the seed and usuallynnot found in the conventional Y- and Z-bar synthetic quartz crystals.nEach new growth region is composed of two sectors of distinct textures.nSoon they disappear due to their high growth velocity, and they arenreplaced by the so-called Z-region. However, the growth process of thesennew sectors grown perpendicular to the internal faces of the V-shapednnotches played an important role in inhibiting the propagation of thendislocation originally present in the seed into the grown Z-region
机译:报道了一种利用特殊的切粒几何形状生长低位错密度的合成石英的方法。用这种方法,允许相对高的位错密度的种子材料。为此目的,制备了新几何形状的种子,并在标准的水热生长条件下生长,在Y方向上较长,并在Z面上制作了多个nV形槽口。通过X射线形貌进行表征研究。结果表明,新的生长区域与种子中形成的V形槽口数量相等,并且通常在常规的Y型和Z型杆合成石英晶体中找不到.n每个新的生长区域都由两个质地不同的扇区组成。它们由于其高的生长速度而消失,因此它们不被所谓的Z区域所取代。然而,垂直于V形缺口内表面生长的新扇区的生长过程在抑制种子中最初存在的然后位错向生长的Z区的扩散中起了重要作用。

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