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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >New seed geometry for growth of low dislocation synthetic quartz
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New seed geometry for growth of low dislocation synthetic quartz

机译:用于低位错合成石英生长的新型晶种

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摘要

A method to grow low dislocation density synthetic quartz by using a special cutting seed geometry is reported. With this method, a relatively high dislocation density seed material is allowable. For such a purpose, a seed of new geometry was prepared and grown in a standard hydrothermal growth condition, long in Y-direction with multiple V-shaped notches made on Z-face. The characterization study was conducted by X-ray topography. The results showed new growth regions, equal to the numbers of V-shaped notches made in the seed and usually not found in the conventional Y- and Z-bar synthetic quartz crystals. Each new growth region is composed of two sectors of distinct textures. Soon they disappear due to their high growth velocity, and they are replaced by the so-called Z-region. However, the growth process of these new sectors grown perpendicular to the internal faces of the V-shaped notches played an important role in inhibiting the propagation of the dislocation originally present in the seed into the grown Z-region.
机译:报道了一种通过使用特殊的切割晶种来生长低位错密度的合成石英的方法。用这种方法,可以得到较高位错密度的种子材料。为此目的,制备了具有新几何形状的种子,并在标准的水热生长条件下生长,在Y方向上较长,并在Z面上制作了多个V形槽口。通过X射线形貌进行表征研究。结果表明,新的生长区域等于种子中形成的V形缺口的数量,通常在常规的Y型和Z型棒合成石英晶体中找不到。每个新的生长区域均由两个不同纹理的区域组成。由于它们的高生长速度,它们很快消失了,并被所谓的Z区域所取代。但是,垂直于V形槽口的内表面垂直生长的这些新扇区的生长过程在抑制最初存在于种子中的位错向生长的Z区域的传播中起着重要作用。

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