...
首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >A study of vacancy-related defects in (Pb,La)(Zr,Ti)O/sub 3/ thin films using positron annihilation
【24h】

A study of vacancy-related defects in (Pb,La)(Zr,Ti)O/sub 3/ thin films using positron annihilation

机译:用正电子an没研究(Pb,La)(Zr,Ti)O / sub 3 /薄膜中与空位有关的缺陷

获取原文
获取原文并翻译 | 示例
           

摘要

The formation of vacancy-type defects in La-doped lead zirconate titanate (PLZT) thin films (Zr/Ti=20/80) was studied as a function of lanthanum doping and after cooling in an oxygen-reduced ambient. The changes in the Doppler-broadening S parameter are consistent with the progressive introduction of Pb-vacancies upon La-doping. Cooling of PLZT thin films with 0 and 10% La doping in 10/sup -5/ Torr oxygen partial pressure after growth exhibits an increase in the density of vacancy-type defects compared to films cooled in 760 Torr. It is proposed that the defects formed are likely cation-oxygen vacancy complexes.
机译:研究了镧掺杂的锆钛酸铅钛酸盐(PLZT)薄膜(Zr / Ti = 20/80)中空位型缺陷的形成与镧掺杂的关系,并在氧还原的环境中冷却后。多普勒扩展S参数的变化与La掺杂时Pb空位的逐步引入是一致的。与在760 Torr中冷却的薄膜相比,在生长后以10 / sup -5 / Torr氧分压对0和10%La掺杂的PLZT薄膜进行冷却显示出空位型缺陷的密度增加。建议形成的缺陷可能是阳离子-氧空位络合物。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号