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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >A study of vacancy-related defects in (Pb,La)(Zr,Ti)O3thin films using positron annihilation
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A study of vacancy-related defects in (Pb,La)(Zr,Ti)O3thin films using positron annihilation

机译:用正电子an没研究(Pb,La)(Zr,Ti)O3薄膜中与空位有关的缺陷

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摘要

The formation of vacancy-type defects in La-doped lead zirconatentitanate (PLZT) thin films (Zr/Ti=20/80) was studied as a function ofnlanthanum doping and after cooling in an oxygen-reduced ambient. Thenchanges in the Doppler-broadening S parameter are consistent with thenprogressive introduction of Pb-vacancies upon La-doping. Cooling of PLZTnthin films with 0 and 10% La doping in 10-5 Torr oxygennpartial pressure after growth exhibits an increase in the density ofnvacancy-type defects compared to films cooled in 760 Torr. It isnproposed that the defects formed are likely cation-oxygen vacancyncomplexes
机译:研究了镧掺杂的锆钛酸铅(PLZT)薄膜(Zr / Ti = 20/80)中空位型缺陷的形成与镧掺杂的关系,并在氧还原的环境中冷却后。然后多普勒扩展S参数的变化与La掺杂后Pb空位的逐步引入是一致的。与在760 Torr中冷却的薄膜相比,生长后在10-5 Torr氧分压下用0%和10%La掺杂的PLZTnthin薄膜的冷却显示出空位型缺陷的密度增加。没有建议形成的缺陷可能是阳离子-氧空位复合体

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