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首页> 外文期刊>IEEE Transactions on Electron Devices >Investigation of negative differential resistance phenomena in GaSb/AlSb/InAs/GaSb/AlSb/InAs structures
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Investigation of negative differential resistance phenomena in GaSb/AlSb/InAs/GaSb/AlSb/InAs structures

机译:GaSb / AlSb / InAs / GaSb / AlSb / InAs结构中的负微分电阻现象研究

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摘要

The negative differential resistance (NDR) phenomena were observed in GaSb/AlSb/InAs/-GaSb/AlSb/InAs resonant interband tunnel structures. Electrons have resonantly achieved interband tunneling through the InAs/GaSb broken-gap quantum well. The InAs well width causes significant variations of the peak current density and NDR behaviors. The peak current density varies exponentially with the AlSb barrier thickness. The multiple NDR behavior was observed with appropriate InAs well and AlSb barrier thicknesses, e.g., 30 /spl Aring/ thick AlSb barrier and 240 /spl Aring/ wide InAs well. Only single negative resistance has, otherwise, been seen. The three-band model was used to interpret the effect of the InAs well and AlSb barrier on the current-voltage characteristics of GaSb/AlSb/InAs/GaSb/AlSb/InAs structures.
机译:在GaSb / AlSb / InAs / -GaSb / AlSb / InAs共振带间隧道结构中观察到负差分电阻(NDR)现象。电子已经通过InAs / GaSb裂隙量子阱共振地实现了带间隧穿。 InAs阱的宽度会导致峰值电流密度和NDR行为的明显变化。峰值电流密度随AlSb势垒厚度的变化呈指数变化。在适当的InAs井和AlSb势垒厚度(例如30 / spl Aring /厚AlSb势垒和240 / spl Aring /宽InAs井)下观察到多种NDR行为。否则,只能看到单个负电阻。三能带模型用于解释InAs阱和AlSb势垒对GaSb / AlSb / InAs / GaSb / AlSb / InAs结构的电流-电压特性的影响。

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