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首页> 外文期刊>Bulletin of the American Physical Society >APS -APS March Meeting 2017 - Event - Ultrasensitive near-infrared photodetectors based on graphene-MoTe$_{mathrm{2}}$-graphene vertical van der Waals heterostructure
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APS -APS March Meeting 2017 - Event - Ultrasensitive near-infrared photodetectors based on graphene-MoTe$_{mathrm{2}}$-graphene vertical van der Waals heterostructure

机译:APS -APS 3月会议2017 - 事件 - 基于Graphene-Mote $ _ {Mathrm {2}} $ - Graphene垂直范德瓦尔斯异质结构的超声 - 超声近红外光电探测器

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摘要

Two-dimensional (2D) materials have rapidly established themselves as exceptional building blocks for optoelectronic applications, due to their unique properties and atomically thin nature. Nevertheless, near-infrared (NIR) photodetectors based on layered 2D semiconductors are rarely realized. In this work, we fabricate graphene-MoTe$_{mathrm{2}}$-graphene vertical vdWs heterostructure by a facile and reliable site controllable transfer method, and apply it for photodetection from visible to the NIR wavelength range. Compared to the 2D semiconductor based photodetectors reported thus far, the graphene-MoTe$_{mathrm{2}}$-graphene photodetector has superior performance, including high photoresponsivity (110 mA W$^{mathrm{-1}}$ at 1064 nm and 205 mA W$^{mathrm{-1}}$ at 473 nm), high external quantum efficiency (extit{EQE}, 12.9{%} at 1064 nm and 53.8{%} at 473 nm), rapid response and recovery processes (rise time of 24 $mu $s, fall time of 46 $mu $s under 1064 nm illumination), and free from an external source-drain power supply. The all-2D-materials heterostructure has promising applications in future novel high responsivity, high speed and flexible NIR devices.
机译:由于其独特的特性和原子薄的性质,二维(2D)材料作为光电应用的特殊构建块。然而,基于层状2D半导体的近红外(NIR)光电探测器很少实现。在这项工作中,我们通过容易和可靠的站点可控传输方法制造石墨烯-Mate $ _ {mathrm {2}} $ - Graphene垂直Vdws异质结构,并将其应用于从纳尔波长范围内可见的光电检测。与迄今为止报告的2D半导体的光电探测器相比,石墨烯-MOTE $ _ {MATHRM {2}} $ - Graphene PhotoDetector具有卓越的性能,包括高光反应性(110 mA W $ ^ {mathrm {mathrm {mathrm {-1}} $ 1064 nm和205 ma w $ ^ {mathrm {-1}} $ at 473 nm),高外部量子效率(extit {eqe},12.9 {%}在473 nm的1064 nm和53.8 {%})快速响应和恢复过程(上升时间为24美元,下降时间为1064纳米照明46美元的时间),并没有外部源排水电源。 All-2D-Materials的异质结构在未来新颖的高响应性,高速和柔性NIR器件中具有希望的应用。

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