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Analysis of multimask fabrication errors for diffractive optical elements

机译:衍射光学元件的多掩模制造误差分析

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摘要

As design algorithms for diffractive optical elements improve, the limiting factor becomes the fabrication process. It is hoped a better understanding of fabrication errors will allow elements with greater tolerance to be designed. This is important for high-power laser fiber coupling, where hot spots lead to failure. We model seven different fan-out gratings applying misetch, misalignment, and feature rounding. Our main findings are that misetch can lead to improved results, misalignment is strongly asymmetric, and both the π and π/2 masks can dominate misalignment. Rounding has a r~2 dependence and potentially can be incorporated into the design stage. Finally we present some experimental data for misalignment.
机译:随着用于衍射光学元件的设计算法的改进,限制因素成为制造过程。希望更好地理解制造误差将允许设计具有更大公差的元件。这对于热点导致故障的高功率激光光纤耦合非常重要。我们对七个不同的扇出光栅进行建模,以应用误蚀刻,未对准和特征舍入。我们的主要发现是,误蚀刻可导致改善的结果,错位高度不对称,并且π和π/ 2掩模均可主导错位。四舍五入具有r〜2依赖性,可以将其纳入设计阶段。最后,我们提出一些未对准的实验数据。

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