基片温度对纳米金刚石薄膜制备的影响

摘要

采用多模谐振腔微波等离子体CVD在不同基片温度下制备了纳米金刚石薄膜,通过扫描电子显微镜(SEM)、原子力显微镜(AFM)和拉曼光谱测试,研究了基片温度对纳米金刚石薄膜性能的影响.结果表明:在其他工艺条件不变时,基片温度对薄膜性能具有较大的影响,较低的基片温度更有利于制备高质量的纳米金刚石薄膜,实验所获得的优化基片温度为720℃左右.%Using multimode resonant cavity microwave plasma CVD apparatus to prepare nano-crystalline diamond thin film at different substrate temperatures, we use scanning electron microscope ( SEM), atomic force microscope ( AFM) and Raman spectroscopy to study the influence of substrate temperature on the properties of nano-crystalline diamond films. The results show that: with the other conditions unchanged, the substrate temperature has a great influence on the properties of the films, the lower substrate temperature is favorable to deposit nano-crystalline diamond films with a better quality, the optimized substrate temperature is about 720 ℃.