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Optical and Structural Properties of Er~(3+)-doped SiO_2-ZrO_2 Glass-Ceramic Thin Film

机译:ER〜(3 +) - 掺杂SiO_2-ZrO_2玻璃陶瓷薄膜的光学和结构性能

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The Er~(3+)-activate dielectric thin film can be applied to produce planar waveguide amplifiers that can be integrated with other active or passive devices on the same chip. However, Er~(3+) tend to cluster in host material especially in silica when doped at high concentration. This issue can be overcome by introducing ZrO_2 as a co-host material in a silica glass matrix by helping to disperse Er~(3+) homogeneously and consequently enhance the output intensity. In this work, we present a study on 70SiO_2-30ZrO_2 glass ceramic doped with a various concentration of Er~(3+) prepared by the sol-gel dip coating technique and each film obtained were annealed at 900°C. Full film densification was achieved for the deposited film, which indicates the hydroxyl group was successfully removed as shown in Raman spectra. Refractive index of the film increase with the increment of rare earth ion and this permit the guiding of light in the film. Red and green emissions of Er ~(3+) were detected upon 514.5 nm excitation. Nevertheless, the presence of higher Er ~(3+) (0.58 mol%) induces concentration quenching phenomena as shown in the PL spectra where there is a decline in green emission peak.
机译:ER〜(3 +) - 激活介电薄膜可以应用于产生平面波导放大器,其可以与同一芯片上的其他有源或无源器件集成。然而,ER〜(3+)倾向于在高浓度下掺杂时的宿主材料中的簇。通过帮助均匀地分散ER〜(3+)并因此提高输出强度,可以通过将ZrO_2作为二氧化硅玻璃基质中作为共同主体材料来克服该问题。在这项工作中,我们展示了通过通过溶胶 - 凝胶浸涂技术制备的各种浓度的ER〜(3+)掺杂的70sio_2-30zro_2玻璃陶瓷的研究,并在900℃下退火所得薄膜。对于沉积的膜来实现全膜致密化,其表示成功除去羟基,如拉曼光谱所示。薄膜的折射率随稀土离子的增量而增加,这允许在薄膜中引导光。在514.5 nm激发时检测到ER〜(3+)的红色和绿色排放。然而,较高的ER〜(3+)(0.58mol%)的存在诱导浓度猝灭现象,如PL光谱所示,绿色发射峰存在下降。

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