Triacrylamide polyfluorinated chalcone derivative as high resistant light-sensitive material for technology of diffractive optical elements

摘要

Abstract: The manufacturing methods and materials for diffractive optical elements are actively developed due to theprospects of their use in various components of the microsystem technology. Photolithography occupies a central placein modern manufacturing technology for such components. The photoresists used in it can be exposed to high (100-150degrees) temperatures, treated in a liquid environment, aggressive (alkaline, acidic) fluids, reactive ion etching (RIE),and electrolyte exposed to electrochemical deposition of metals. Therefore, the development of photoresist materialswith thermo-, plasma-, chemo- and moisture resistance is relevant and of the high interest at this time. One of thepromising classes of organic compounds with photoresistive properties is the chalcones. It is shown thatpolyfluorochalcones are capable of providing the holographic recording of transmission gratings with diffractionefficiency up to 59% and angular selectivity up to 54.5°. The masking and thermal properties of triacrylamidepolyfluorochalcon (TAPCh), its triaryl pyrazoline modification (TAP), as well as modifications by prepolymerizedtriaryl pyrazoline (polyTAP) under liquid chemical conditions (in H_2SO_4, H_3PO_4, NaOH) and reactive ion etching (inplasma CF4) were investigated. A comparison of properties with commercially available photoresists SU-8, AZ4562 wasalso conducted. It has been shown that TAFH is resistant to liquid etching, which is the same for SU-8, but shows higherresults in RIE process; TAFH exceeds the performance of photoresist AZ4562 in resistance to RIE, and significantlyexceeds it in liquid (alkaline and acid) etching; thermal stability TAFH exceeds SU-8 and AZ4562.