Abstract: A method for obtaining uniform alignment of ferroelectric liquid crystal (FLC) is presented. The uniform alignment is realized by ultrathin ($LS 80 angstroms) silicon monoxide (SiO) film evaporated at 80$DGR and the treatment of A.C. electric field. The alignment effects of ultrathin SiO film and thick SiO film ($GRT 1000 angstroms) both evaporated at 80$DGR are compared. The layer direction of FLC cell with ultrathin SiO film at 80$DGR is perpendicular to that with thick film at the same deposition angle. The advantage of the ultrathin film is that the FLC cell aligned by this method can be easily treated to exhibit perfect bistability, excellent contrast and fast switching speed. The possible relation between the molecular orientation and the topographies of the SiO films is analyzed.!9
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