首页> 外文会议>International Symposium on Discharges and Electrical Insulation in Vacuum >Prestriking characteristics when switching on inrush current in 40.5kV VIs
【24h】

Prestriking characteristics when switching on inrush current in 40.5kV VIs

机译:在40.5kV VI中接通浪涌电流时的预激特性

获取原文

摘要

Nowadays the phase control closing technology is a preferred method for capacitive switching. Thus the distribution of prestrike gaps is important for the control strategy. The objective of this paper is to understand the distribution of prestrike gaps for the contact materials manufactured by infiltration and arc-melted preparing technology in the capacitive service condition of 40.5kV vacuum circuit breakers (VCBs). In the experiment, CuCr50 and CuCr40 contacts with a diameter of 50 millimeters were prepared by infiltration and arc-melted technology respectively. L-C oscillating circuit generated inrush current with a frequency of 207Hz and with a peak of 6.48kA, while the applied voltage was 46.3kV which is equivalent to the peak voltage for a 35kV three-phase network whose capacitive voltage factor is 1.4. The experimental results show that the complementary cumulative probability of the prestrike gap dpre follows the 3-parameter Weibull distribution. The d100 below which prestrike would always occur is similar for all six test VIs, while the scattering of the prestrike gap is different. It means the distributions of prestrike gaps for all six VIs significantly varies with closing operations as the contact materials and preparing technologies are different. Thus the distribution of prestrike gaps is important when employing phase control closing technology in VCBs for the capacitive switching.
机译:如今,相位控制闭合技术已成为电容切换的首选方法。因此,打击前间隙的分布对于控制策略很重要。本文的目的是了解在40.5kV真空断路器(VCB)的电容性使用条件下,通过渗透和电弧熔化制备技术制造的接触材料的预触间隙的分布。在实验中,分别通过渗透和电弧熔化技术制备了直径为50毫米的CuCr50和CuCr40触头。 L-C振荡电路产生的涌入电流的频率为207Hz,峰值为6.48kA,而施加的电压为46.3kV,相当于电容性电压因数为1.4的35kV三相电网的峰值电压。实验结果表明,前击间隙dpre的互补累积概率服从3参数威布尔分布。在所有六个测试VI中,总是会发生预打击的d100是相似的,而预打击间隙的散射是不同的。这意味着,由于接触材料和制备技术的不同,所有六个VI的预击间隙的分布随闭合操作而显着变化。因此,当在VCB中采用相位控制闭合技术进行电容开关时,预触间隙的分布很重要。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号