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Characteristics of vacuum breakdown field and comparison of field enhancement factor β in CuCr electrodes with slit configuration

机译:狭缝型CuCr电极的真空击穿场特性及场增强因子β的比较

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A contact electrode of vacuum interrupter (VI) has slit parts on the electrode surface to control the vacuum arc during the current interruption. The edge configuration of the slit is important for the withstand performance of high voltage application for VI. We investigated the effect of the curvature radius of slit's configuration on the field enhancement factor β and the characteristics of vacuum breakdown for the slit electrodes made of CuCr alloy simplified simulating the AMF-electrode. As the results, the round chamfered configuration at the edge of slit increases the breakdown field, because of the reduction of pre-breakdown current flowing, that is, small field emission current. This is due to be small β-value by rounding chamfering of the edge at the slit. The BD field of the slit electrode can be improved by rounding the edge of the end of the slit more than 1 mm curvature radius, and the curvature of 0.5 mm radius for R0.5 slit electrode had almost little effect on improving the BD field owing to manufacturing inadequate curvature at the edge of slit.
机译:真空灭弧室(VI)的接触电极在电极表面上具有狭缝部分,以在电流中断期间控制真空电弧。狭缝的边缘配置对于VI的高压应用耐受性能很重要。我们研究了狭缝形状曲率半径对场增强因子β的影响以及由CuCr合金制成的狭缝电极的真空击穿特性,简化了AMF电极的模拟。结果,由于减小了击穿前电流的流动,即减小了小场发射电流,在狭缝边缘的倒角形状增加了击穿场。这是由于通过在切缝处对边缘进行倒角而使β值较小。可以通过将狭缝末端的边缘修圆超过1 mm曲率半径来改善狭缝电极的BD场,而R0.5狭缝电极的0.5 mm半径的曲率对改善BD场几乎没有影响导致缝隙边缘的曲率不足。

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