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Fabrication and characterization of high power Gallium Nitride based terahertz Gunn diodes

机译:高功率氮化镓基氮化物的制造与表征Terahertz Gunn二极管

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摘要

In this paper, we report the fabrication and characterization of a THz Gunn source based on Gallium Nitride (GaN) with side-contact and field-plate technologies. This source works stable at operating voltages up to 20 V due to good passivation layer and good heat sink to the GaN substrate. The GaN-based Gunn diode has relatively high forward current of 0.9 A and a high current drop of about 50 mA for higher frequency and output power.
机译:在本文中,我们报告了基于氮化镓(GaN)的Thz Gunn源的制造和表征,具有侧接触和现场板技术。由于良好的钝化层和良好的散热器到GaN衬底,该来源在高达20 V的工作电压下工作稳定。 GaN的GUNN二极管具有0.9a的相对高的前进电流和高电流下降约50 mA,用于更高的频率和输出功率。

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