首页> 外文会议>Conference on Laser-based Micro- and Nanopackaging and Assembly; 20080122-24; San Jose,CA(US) >Joining of thin glass with semiconductors by ultra-fast high-repetition laser welding
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Joining of thin glass with semiconductors by ultra-fast high-repetition laser welding

机译:通过超快速高重复激光焊接将薄玻璃与半导体连接起来

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Lighting applications like OLED or on silicon for electro-optical applications need a reproducible sealing process. The joining has to be strong, the permeability for gasses and humidity very low and the process itself has to be very localized not affecting any organic or electronic parts inside the sealed region. The actual sealing process using glue does not fulfill these industrial needs. A new joining process using ultra-fast laser radiation offers a very precise joining with geometry dimensions smaller than 50 μm Ultra-fast laser radiation is absorbed by multi-photon absorption in the glass. Due to the very definite threshold for melting and ablation the process of localized heating can be controlled without cracking. Repeating the irradiation at times smaller than the heat diffusion time the temperature in the focus is increased by heat accumulation reaching melting of the glass. Mowing the substrate relatively to the laser beam generates a seal of re-solidified glass. Joining of glass is achieved by positioning the laser focus at the interface. A similar approach is used for glass-silicon joining. The investigations presented will demonstrate the joining geometry by microscopy of cross-sections achieved by welding two glass plates (Schott D263 and AF45) with focused IR femtosecond laser radiation (wavelength λ = 1045nm, repetition rate f = 1 MHz, pulse duration t_p = 500 fs, focus diameter w_0 = 4 μm, feeding velocity v = 1-10 mm/s). The strength of the welding seam is measured by tensile stress measurements and the gas and humidity is detected. A new diagnostic method for the on-line detection of the welding seam properties will be presented. Using a non-interferometric technique by quantitative phase microscopy the refractive index is measured during welding of glass in the time regime 0-2 μs. By calibration of the measured refractive index with a relation between refractive index and temperature a online-temperature detection can be achieved.
机译:OLED等照明应用或用于电光应用的硅上照明需要可重复的密封过程。连接必须牢固,对气体和湿气的渗透性必须非常低,并且过程本身必须非常局部化,而不会影响密封区域内的任何有机或电子零件。使用胶的实际密封过程不能满足这些工业需求。使用超快激光辐射的新连接工艺可提供非常精确的连接,其几何尺寸小于50μm。超快激光辐射可通过玻璃中的多光子吸收来吸收。由于非常确定的熔化和烧蚀阈值,可以控制局部加热过程而不会产生裂纹。在小于热扩散时间的时间重复照射,由于热量累积达到玻璃的熔化,焦点温度升高。相对于激光束修剪基板会产生重新固化的玻璃密封。玻璃的接合是通过将激光焦点定位在界面上来实现的。类似的方法用于玻璃-硅接合。进行的研究将通过用截面的红外飞秒激光辐射(波长λ= 1045nm,重复频率f = 1 MHz,脉冲持续时间t_p = 500)焊接两块玻璃板(Schott D263和AF45)来实现横截面的显微镜观察,从而证明接合几何形状fs,焦点直径w_0 = 4μm,进给速度v = 1-10 mm / s)。通过拉伸应力测量来测量焊缝的强度,并检测气体和湿度。将提出一种在线检测焊缝特性的新诊断方法。使用通过定量相显微镜的非干涉技术,在玻璃焊接过程中以0-2μs的时间范围测量折射率。通过用折射率和温度之间的关系校准测得的折射率,可以实现在线温度检测。

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