首页> 外文会议>9th International conference on commercialization of micro and nano systems (COMS 2004) >Silicon Surface Micromachined Deformable Mirrorsfor Fast Light Valves
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Silicon Surface Micromachined Deformable Mirrorsfor Fast Light Valves

机译:硅表面微加工可变形反射镜,用于快速光阀

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Moving mirror structures are electrostatically deflected to modulate an incident lightrnbeam into discrete binary elements, with switching speeds at 10 MHz and above. Thernmirror elements display a high reflectivity in the "on" state, making them useful forrnapplications where optical throughput is important. Zeroth-order contrast has beenrnobserved as high as 65:1. The mirror to mirror spacing can be as close as is allowed byrnlithographic methods; we demonstrate 1 micron spacing with 40 micron pixel size. Therndesign delivers extremely high speeds, due to the large restoring force of a tautrnmembrane-like structure.rnThe fabrication techniques allow high yield and ease of manufacture. A nine layer stackrnof thin films is deposited in sequence with no intervening processing steps, providing arnmirror surface with extremely low roughness. The selective nature of the subsequentrnetching processes then allow device fabrication using only three lithography steps.rnThe relatively simple design within a MEMS-specific fabrication facility also allows forrnmaterials control and choices not available within a CMOS fabrication facility. Materialsrnand process optimization were the dominant hurdles to overcome in the six yearrndevelopment cycle, but with control over these parameters and processes, highrnperformance is available from a very simple and robust process.rnApplications for this device are varied and still being explored. Early results in fieldrntrials after 5 years of bench testing are extremely encouraging. Any application whichrnrequires modulation of high energy lasers into discrete elements is a candidate for such arndevice.
机译:动镜结构被静电偏转,以将入射光束调制为离散的二元元素,其开关速度为10 MHz或更高。热反射镜元件在“开”状态下显示出高反射率,从而使其对于光通量很重要的应用很有用。零阶对比度高达65:1。镜与镜之间的间距可以与光刻方法所允许的尽可能近。我们展示了1微米间距和40微米像素尺寸。由于拉紧式膜状结构的巨大恢复力,Therndesign可提供极高的速度。制造技术可实现高产量和易于制造。依次沉积九层叠层薄膜,无需任何中间处理步骤,从而为反光镜表面提供了极低的粗糙度。然后,后续压痕工艺的选择性性质允许仅使用三个光刻步骤进行器件制造。在MEMS专用制造设施内相对简单的设计还允许在CMOS制造设施内无法进行的材料控制和选择。材料和工艺优化是六年发展周期中要克服的主要障碍,但是通过控制这些参数和工艺,可以通过非常简单和强大的工艺获得高性能。该设备的应用各不相同,并且仍在探索中。经过5年的基准测试,现场试验的早期结果令人鼓舞。任何需要将高能激光器调制成分立元件的应用都可以用于这种arndevice。

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