Board processing device, board processing method, training data generation method, learning method, learning device, trained model generation method, and trained model

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of more appropriately adjusting the exhaust pressure of a processing unit. A substrate processing apparatus 100 includes a plurality of processing units 1A1, 1B1, a plurality of individual exhaust pipes 41A, 41B, a common exhaust pipe 81A, a plurality of first pressure adjusting mechanisms 73A1, 73B1, and a second pressure adjusting mechanism 87A. And a control unit 102. The gas exhausted from the processing units 1A1 and 1B1 flows into the individual exhaust pipes 41A and 41B. The gas exhausted from the individual exhaust pipes 41A and 41B flows into the common exhaust pipe 81A. The first pressure adjusting mechanisms 73A1 and 73B1 adjust the pressure of the gas flowing into the individual exhaust pipes 41A and 41B from the processing units 1A1 and 1B1. The second pressure adjusting mechanism 87A adjusts the pressure of the gas inside the common exhaust pipe 81A. The control unit 102 acquires the processing pressure adjustment information that defines the operation of the plurality of first pressure adjustment mechanisms 73A1 and 73B1 and the operation of the second pressure adjustment mechanism 87A from the trained model LM. [Selection diagram] FIG. 10