A system for the production of a transparent conductive film

摘要

System for the production of a transparent, conductive film, comprising:an abrasive coating device configured for the production of AgNWs and CuNPs on a PI substrate at 2500 U/min for one minute, dispersing AgNWs and CuNPs overnight in IPA;a furnace for tempering the slag-coated substrate at 50oC for ten minutes to ensure adherence of AgNW+CuNPs to the substrate; anda pair of contact electrodes from a silver paste applied to the two vertical sides of the accelerator-coated PI substrate.