首页> 外国专利> Precision fabrication of nanosieves

Precision fabrication of nanosieves

机译:纳米尺度的精确制造

摘要

An exemplary method includes forming a sacrificial layer along sidewalls of an array of trenches that are indented into a substrate, depositing a fill layer over the sacrificial layer, and then creating an array of gaps between the fill layer and the substrate by removing the sacrificial layer along the sidewalls of the trenches, while maintaining a structural connection between the substrate and the fill layer at the floors of the trenches. The method further includes covering the substrate, the fill layer, and the gaps with a cap layer that seal fluid-tight against the substrate and the fill layer. The method further includes indenting a first reservoir and a second reservoir through the cap layer, and into the substrate and the fill layer, across the lengths of the array of gaps, so that the array of gaps connects the first reservoir in fluid communication with the second reservoir.
机译:一种示例性方法包括沿着沟槽阵列的侧壁形成牺牲层,该沟槽的侧壁凹进到基板上,通过去除牺牲层来在填充层和基板之间形成一系列间隙阵列 沿着沟槽的侧壁,同时在沟槽的地板上保持基板和填充层之间的结构连接。 该方法还包括覆盖基板,填充层和间隙,盖层密封抵靠基板和填充层。 该方法还包括穿过盖层的第一储存器和第二贮存器,并进入基板和填充层,横跨间隙阵列的长度,使得间隙阵列与流体连通的第一储存器连接 第二个水库。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号