ADVANCED PHOTORESIST PROCESS QUALITY EVALUATION METHOD AND SYSTEM

摘要

An advanced photoresist process quality evaluation method and system. The advanced photoresist process quality evaluation system comprises an image acquisition module (1), a contour extraction module (2), a roughness calculation module (3), a fitting module (4), a characteristic analysis module (5), and a quality evaluation module (6); the image acquisition module (1), the contour extraction module (2), the roughness calculation module (3), the fitting module (4), the characteristic analysis module (5), and the quality evaluation module (6) are connected in sequence, to perform photolithography on an obtained photoresist and obtain an electron beam microscopic image (S101), extract the photoresist edge contour according to the electron beam microscopic image (S102), calculate the edge roughness and the width roughness (S103), calculate a power spectral density curve by utilizing a fitting function and obtain fitting parameters (S104), calculate all characteristic parameters of the electron beam microscopic image (S105), and establish a photoresist quality evaluation table according to characteristic values of the photoresist (S106). Thus, an optimal photoresist product can be selected.