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Manufacturing method of ultraviolet laser diode and ultraviolet laser diode

机译:紫外激光二极管和紫外激光二极管的制造方法

摘要

Problem to be solved: to provide a method of manufacturing an ultraviolet laser diode having a low oscillation threshold current density.On the substrateFirst cladding layerLuminescent layerSecond cladding layerAndA step of forming a laminate forming a nitride semiconductor stack (step S101) andAt least a portion of the nitride semiconductor stack is etchedForm a mesa structureThe ratio of the length of the resonator end surface to the length of the side surface of the mesa structure in plane viewA mesa structure forming step with a ratio of 1:5 or more to 1:500 or less (step S102);On part of the first areaA first conductive material is disposed andA first electrode forming step (step S103) for heat treatment at 400.degree. C. or moreAn area on the second cladding layer;Distance to side μ In areas greater than or equal toA second electrode forming step (step S104) to place the second conductive material.Diagram
机译:要解决的问题:提供一种制造具有低振荡阈值电流密度的紫外线激光二极管的方法。将基板熔点包覆层致发光的层间覆层,形成氮化物半导体堆叠的层压板(步骤S101)和最小一部分 氮化物半导体叠层被蚀刻谐振器端面长度与平面视图MESA结构形成步骤的谐振器端面长度与侧面表面的长度的长度的MESA结构比率为1:5或更多至1:500或 较少(步骤S102);在第一区域的一部分上,设置第一导电材料,并且第一电极形成步骤(步骤S103),用于在400°C处热处理。 C.或Morean区域在第二包层;在大于或等于第二电极形成步骤的区域距侧μ(步骤S104)以放置第二导电材料.DiaGram

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