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IMPROVED APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM

机译:改进了调制供应在等离子体处理系统中的应用

摘要

Plasma processing systems and methods are disclosed. The system may include at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. A synchronization module configured to send a synchronization signal with a synchronization-signal-repetition-period that is an integer multiple of T to at least one piece of equipment connected to the plasma processing system. A waveform-communication module communicates characteristics of a characterized waveform to at least one piece of equipment connected to the plasma system to enable synchronization of pieces of equipment connected to the plasma processing system. The characterized waveform may contain information about the modulation of the plasma or information about a desired waveform of a piece of equipment connected to the plasma processing system.
机译:公开了等离子体处理系统和方法。 该系统可以包括至少一个调制电源,该调制电源调制等离子体特性,其中等离子体属性的调制具有重复时段T.,同步模块被配置为将具有同步信号重复的同步信号发送的同步信号是整数多个 T到至少一件连接到等离子处理系统的设备。 波形通信模块将所表征波形的特性传送到连接到等离子体系统的至少一件设备,以实现连接到等离子体处理系统的设备的同步。 所表征的波形可以包含关于等离子体的调制的信息或关于连接到等离子体处理系统的一件设备的所需波形的信息的信息。

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