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Backscattered electron (BSE) imaging with multi-beam tools
Backscattered electron (BSE) imaging with multi-beam tools
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机译:具有多梁工具的反向散射电子(BSE)成像
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摘要
Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.
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