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DISLOCATION DISTRIBUTION FOR SILICON CARBIDE CRYSTALLINE MATERIALS

机译:碳化硅晶体材料的错位分布

摘要

Silicon carbide (SiC) wafers, SiC boules, and related methods are disclosed that provide improved dislocation distributions. SiC boules are provided that demonstrate reduced dislocation densities and improved dislocation uniformity across longer boule lengths. Corresponding SiC wafers include reduced total dislocation density (TDD) values and improved TDD radial uniformity. Growth conditions for SiC crystalline materials include providing source materials in oversaturated quantities where amounts of the source materials present during growth are significantly higher than what would typically be required. Such SiC crystalline materials and related methods are suitable for providing large diameter SiC boules and corresponding SiC wafers with improved crystalline quality.
机译:公开了碳化硅(SiC)晶片,SiC槽和相关方法,其提供了改进的位错分布。提供了SIC横果,其展示了减少的位错密度,并在较长的横槽长度上提高了位错均匀性。相应的SiC晶片包括减少总位错密度(TDD)值并改善了TDD径向均匀性。 SiC结晶材料的生长条件包括在过饱和量中提供源材料,其中增长期间存在的源材料的量明显高于通常需要的。这种SiC结晶材料和相关方法适用于提供大直径的SiC槽和相应的SiC晶片,具有改善的晶体质量。

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