Sputtering target material, manufacturing method of sputtering target material, and manufacturing method of laminated substrate with piezoelectric thin film

摘要

Problem to be solved: to provide a sputtering target material comprising a sintered body represented by a composition formula (K1 xnax) NbO3 (0 < x < 1).A sputtering target material comprising a sintered body represented by a compositional formula (K1 xnax) NbO3 (0 < x < 1) and containing a metal element selected from the group consisting of Cu and Mn at a concentration of 0.2 at% or more than 0.6 at%.Diagram