Device for cleaning granular auxiliaries from industrial processes contaminated with particulate matter; where the impurities are greater than the particulates of the granular auxiliary material and where the device has a sieve alignment in a particle stream of the granular auxiliary material contaminated and where a sieve section of the sieve alignment is thus formed, that at least a large proportion of the impurities are separable from the granular auxiliary material, thereby characterised,that the sieve layer has a first sieve floor and a second sieve floor and that in the direction of particle flow the second sieve floor is first arranged and then the first sieve floor and that the first sieve floor has a sieve section which is essentially only passable from the granular auxiliary material and that the second sieve floor is has a seven-section,which is permeable by particulate matter of a particle size below a first particle size of the particulate matter present in the particle stream and the granular auxiliary material, and that a sieve plane of the second sieve floor with an angle of less than 90-degree is inclined towards a longitudinal axis of the particle stream; is.
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