首页> 外国专利> IMPRINTED SUBSTRATES

IMPRINTED SUBSTRATES

机译:印迹基板

摘要

Imprinted substrates are often used to produce miniaturized devices for use in electrical, optic and biochemical applications. Imprinting techniques, such as nanoimprinting lithography, may leave residues in the surface of substrates that affect bonding and decrease the quality of the produced devices. An imprinted substrate with residue-free region, or regions with a reduced amount of residue for improved bonding quality is introduced. Methods to produce imprinted substrates without residues from the imprinting process are also introduced. Methods include physical exclusion methods, selective etching methods and energy application methods. These methods may produce residue-free regions in the surface of the substrate that can be used to produce higher strength bonding.
机译:印迹基材通常用于生产用于电气,光学和生物化学应用的小型化装置。印迹技术,例如纳米压印光刻,可以将残留物留在影响粘合的基板表面中并降低所生产装置的质量。引入了具有残留物区域的印迹基材,或具有减少量残余物的用于改进的键合质量的区域。还介绍了在没有来自压印过程中没有残留物的压印基材的方法。方法包括物理排除方法,选择性蚀刻方法和能量应用方法。这些方法可以在基板的表面中产生残留物区域,其可用于产生更高的强度键合。

著录项

  • 公开/公告号US2021170400A1

    专利类型

  • 公开/公告日2021-06-10

    原文格式PDF

  • 申请/专利权人 ILLUMINA INC.;

    申请/专利号US202117169181

  • 发明设计人 HUI HAN;DAJUN YUAN;M. SHANE BOWEN;

    申请日2021-02-05

  • 分类号B01L3;B29C65/16;B29C65/14;H01J37/32;G03F7/038;G03F7;B81C1;

  • 国家 US

  • 入库时间 2022-08-24 19:08:24

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号