首页> 外国专利> Improvements relating to photo-conductive targets and especially television pick-up tubes and analogous image pick-up tubes

Improvements relating to photo-conductive targets and especially television pick-up tubes and analogous image pick-up tubes

机译:有关光电导目标的改进,尤其是电视摄像管和类似图像摄像管

摘要

794,331. Semi-conductor devices. ELECTRIC & MUSICAL INDUSTRIES, Ltd. Aug. 11, 1954 [Aug. 11, 1953], No. 22096/53. Class 37. [Also in Group XL (a)] Time-lag in a low-velocity photo-conductive iconoscope is reduced by increasing the thickness of the target layer above 8 microns and so reducing the capacity. This is done by combining the photo-conductive layer with a further thicker layer of semi-conductive material having a range, for the charge carrier involved in the photo-conduction, which is long compared with that of the photo-conductive layer, so as not to impede conduction. In one form the photo-conductive layer 5 of P-type material (such as Se or Se+Te) is deposited directly on the conductive signal plate 4, and the layer 6 of P-type semi-conductor covers the layer 5 and is exposed to the scanning beam. The layer 6 may be a single crystal, or of mosaic form to reduce transverse conduction; it may be cassitarite (SnO 2 ), Brookite (TiO 2 ), polybasite (9Ag 2 S, Sb 2 S 3 ) or spodumene (LiAl(SiO 4 ) 2 ). In another form, an N-type photo-conductive layer of antimony trisulphide is deposited on one side of an N- type semi-conductive layer of Rochelle salt or alkali halide, and a signal plate on the other side. To improve colour response the second layer may also be photo-conductive, for example, to blue light while passing on the red light to the red-sensitive first layer; in this case the second layer may be cadmium sulphide. The relative thicknesses may be 0.5 microns for the photo-conductor and 19.5 microns for the semi-conductor. Specification 794,332 is referred to. Reference has been directed by the Comptroller to Specification 705,533.
机译:794,331。半导体器件。电气与音乐工业有限公司1954年8月11日[八月。 [1953年11月11日],第22096/53号。第37类。[XL(a)组中的另一个]通过将目标层的厚度增加到8微米以上,从而减小了容量,从而减少了低速光电导式像镜的时间延迟。这是通过将光导层与更厚的半导电材料层结合而完成的,该层的范围比光导层长,该范围涉及光导中涉及的电荷载体,因此不妨碍传导。在一种形式中,将P型材料(例如Se或Se + Te)的光电导层5直接沉积在导电信号板4上,并且P型半导体层6覆盖该层5并且是暴露于扫描光束。层6可以是单晶或镶嵌的形式以减少横向传导。它可以是钙钛矿(SnO 2),板钛矿(TiO 2),多钛铁矿(9Ag 2 S,Sb 2 S 3)或锂辉石(LiAl(SiO 4)2)。在另一形式中,三硫化锑的N型光电导层沉积在罗谢尔盐或碱金属卤化物的N型半导电层的一侧,另一侧沉积信号板。为了改善色彩响应,第二层也可以对蓝光具有光电导性,同时将红光传递到对红敏的第一层上。在这种情况下,第二层可以是硫化镉。对于光电导体,相对厚度可以是0.5微米,对于半导体,相对厚度可以是19.5微米。参考规范794,332。主计长已参考规范705,533。

著录项

  • 公开/公告号GB794331A

    专利类型

  • 公开/公告日1958-04-30

    原文格式PDF

  • 申请/专利权人 ELECTRIC & MUSICAL INDUSTRIES LIMITED;

    申请/专利号GB19530022096

  • 发明设计人 LUBSZYNSKI HANS GERHARD;

    申请日1953-08-11

  • 分类号H01J29/45;

  • 国家 GB

  • 入库时间 2022-08-23 20:25:20

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