首页> 外国专利> Glass on the basis of zno - b2o3 - sio2 with a thermal ausdehnungskoffizienten of 44,5 to 44,8.10 - 7 / deg.c (0 to 300 deg.c)

Glass on the basis of zno - b2o3 - sio2 with a thermal ausdehnungskoffizienten of 44,5 to 44,8.10 - 7 / deg.c (0 to 300 deg.c)

机译:基于zno-b2o3-sio2的玻璃,其热能强度为44,5至44,8.10-7 /摄氏度(0至300摄氏度)

摘要

A glass consists essentially, in weight per cent, of ZnO 60, B2O3 23-25, SiO2 9.4-10.5, CeO2 3, Bi2O3 0-0.1, PbO 2-3, Sb2O3 0.5. This glass is used to coat an electrical device such as diode, including a silicon crystal semi-conductor element in the form of a wafer with electrical conductors connected to either side of the wafer, by applying the glass in finely divided form to the surface of a semi-conductor device comprising an N-type region and a P-type region with each region fused to an aluminium contact, each contact being bonded to a heat sink electrode member selected from (a) molybdenum; (b) tungsten; (c) an iron base alloy with 28-30% Ni, 15-18% Co and a fractional amount of Mn, to form a coating extending partially over and in sealing relation with each of the heat sink members, the surface with the coating thereon being heated to melt the glass particles together into a unitary mass sealed to the body. The coating may be applied in the form of a slurry, prepared by mixing powdered glass with a conventional organic binder, such as nitrocellulose, and a vehicle, such as deionized water, the slurry being sprayed or painted on to the substrate. The assembly is heated to drive off the binder and the vehicle, and the coating vitrified by heating at 775 DEG to 825 DEG C. for 2 to 5 minutes, vitrification taking place in an inert atmosphere, or in a vacuum, to prevent oxidation of the molybdenum parts of the diode. Prior to applying the glass coating the semi-conducting body and sealing surfaces of the heat sink members may be cleaned by etching to remove undesirable contaminants. Several layers of coating may be applied to produce the desired thickness, a thickness of at least 10,000 Angstroms being desirable. The coefficient of thermal expansion of the glass used may be controlled by heat treatment to be within the range 37.5 x 10-7/ DEG C. to 44.9 x 10-7/ DEG C., the powdered glass being heated in graphite moulds for various times and temperatures to provoke nucleation of the sintered glass. The coefficient of expansion of the coating glass can be selected to match that of the electrically conducting parts of the diode.
机译:玻璃基本上以重量百分比包括ZnO 60,B 2 O 3 23-25,SiO 2 9.4-10.5,CeO 2 3,Bi 2 O 3 0-0.1,PbO 2-3,Sb 2 O 3 t 0.5。通过将玻璃细分后的玻璃应用于玻璃表面,可将该玻璃用于涂覆诸如二极管之类的电气设备,包括硅片形式的硅晶体半导体元件,其电导体连接至硅片的任一侧。一种半导体器件,包括一个N型区和一个P型区,每个区与一个铝触点熔合,每个触点与选自(a)钼的散热电极部件相连。 (b)钨; (c)具有28-30%的Ni,15-18%的Co和少量的Mn的铁基合金,以形成部分地在每个散热器构件上方并与之密封地延伸的涂层,具有该涂层的表面其上被加热以将玻璃颗粒熔化在一起成为密封到主体的整体块。涂层可以以淤浆的形式施加,该淤浆是通过将粉末玻璃与常规的有机粘合剂(例如硝酸纤维素)和媒介物(例如去离子水)混合而制备的,该淤浆被喷涂或涂在基底上。加热组件以除去粘合剂和媒介物,并通过在775℃至825℃下加热2至5分钟使涂层玻璃化,在惰性气氛或真空中进行玻璃化以防止氧化。二极管的钼部分。在施加玻璃涂层之前,可以通过蚀刻清洁散热器部件的半导体本体和密封表面以去除不希望的污染物。可以涂覆几层涂层以产生所需的厚度,希望至少为10,000埃的厚度。可以通过热处理将所用玻璃的热膨胀系数控制在37.5×10-7 /℃至44.9×10-7 /℃的范围内,将粉末状玻璃在石墨模具中加热以用于各种用途。时间和温度引起烧结玻璃成核。可以选择镀膜玻璃的膨胀系数以匹配二极管的导电部分的膨胀系数。

著录项

  • 公开/公告号DE1596820B1

    专利类型

  • 公开/公告日1971-05-19

    原文格式PDF

  • 申请/专利权人 GEN ELECTRIC;

    申请/专利号DE1966G048017

  • 申请日1966-09-28

  • 分类号C03C3/12;

  • 国家 DE

  • 入库时间 2022-08-23 09:51:39

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号