首页> 外国专利> Thin film resistor network prodn - using cermet on insulated substrate followed by nickel-chromium and gold

Thin film resistor network prodn - using cermet on insulated substrate followed by nickel-chromium and gold

机译:薄膜电阻器网络产品-在绝缘衬底上使用金属陶瓷,然后是镍铬和金

摘要

A coating of photo sensitive, etch resistant, positive varnish which is exposed first to a common negative for both high and low value resistors and for the conductor tracks and contact pads. After developing, all three layers are etched away down to the substrate. Separate exposures are then made for the high value resistors followed by etching down to the cermet and for the low value resistors followed by selective etching away of the gold only. Finally the remaining photoresist is cleaned off.
机译:光敏,耐腐蚀,正型清漆涂层,首先将其暴露在高值和低值电阻器以及导体走线和接触垫的公共负极上。显影后,所有三层都被蚀刻掉至基板。然后分别对高值电阻器进行单独曝光,然后蚀刻至金属陶瓷,对低值电阻器进行曝光,然后仅选择性地蚀刻掉金。最后,剩余的光致抗蚀剂被清除。

著录项

  • 公开/公告号DE2044255A1

    专利类型

  • 公开/公告日1972-03-09

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE19702044255

  • 发明设计人

    申请日1970-09-07

  • 分类号H01C7/00;

  • 国家 DE

  • 入库时间 2022-08-23 08:21:56

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