A method and device for the production of a thinner layers on surfaces, by evaporation of the material forming the layer in a vacuum

摘要

1,263,582. Vacuum vapour deposition. BARR & STROUD Ltd. Aug.21, 1970 [Sept. 19, 1969], No.46185/69. Heading C7F. A method of depositing a thin film on a surface by evaporation within a vacuum chamber which includes a discharge source of electromagnetic energy for effecting cleaning of a said surface includes the steps of reducing the pressure within the chamber to approximately 10SP-5/SP Torr, energizing said energy source, leaking gas into the chamber to raise the pressure therein to approximately 5 x 10SP-5/SP Torr to enable a discharge from said source to be sustained; during said discharge heating the evaporant and confining heated evaporant in an enclosure, and releasing said heated evaporant after a predetermined time whereby the evaporant is deposited in thin film form on the surface. One or more layers may be deposited; substrates mentioned are glass, Si, Ge, arsenic triselenide and arsenic trisulphide; the coating may be MgF 2 or Al and the atmosphere air. The discharge source of electromagnetic energy may comprise a R.F. generator of 200 watts output at 10-20 MHz in conjunction with an amplifier and quarter-wavelength aerial; the latter may be outside a non-conducting, e.g. glass, chamber or inside a metal coating chamber. D.C. coils may be mounted outside the chamber to give a magnetic bottle effect to prevent discharge of R. F. energy via the chamber walls.